Vortek performs research and development on the production of high intensity optical radiation and on its accurate delivery to a target – principally for semiconductor wafer processing. Research is also undertaken on the target‘s reaction to the irradiance as well as to develop diagnostics to measure results.
Our research interests on radiation sources and systems include plasma physics, heat transfer, multiphase fluid flow, electrical engineering and metallurgy. Lamps with continuous operation up to 750kW and pulsed powers to 100MW are currently being developed. Both systems are an order of magnitude more powerful than other available systems.
Optical radiation is collected from the sources and delivered to targets using non-imaging optics. The unique high powered sources used by Vortek require R&D in reflector materials, optical design techniques and fabrication techniques for precision high power reflectors.
We have developed revolutionary non-contact temperature measurement techniques to measure silicon wafer temperatures above 1000°C to better than 2°C repeatability. These measurements are taken over the full wafer during the entire process cycle. This is the most accurate measuring system available and the only system that gives data on production wafers.
A selection of Vortek‘s published research papers are available here for download in .pdf format.
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